International
Electrotechnical
Commission
International Standards and Conformity Assessment
for all electrical, electronic and related technologies
SC 47F |
Micro-electromechanical systems |
Detail
Committee | Working Groups | Project Leader | Current Status | Frcst Pub Date | Stability Date |
|---|---|---|---|---|---|
| SC 47F | 01 | Prof. S. Park & Dr. J-S. Park | A2CD | 2014-08 |
History
Stage | Document | Downloads | Decision Date | Target Date | ||||
|---|---|---|---|---|---|---|---|---|
| PNW |
| 2011-09-30 | ||||||
| ANW |
| 2012-01-11 | 2012-02-15 | |||||
| 1CD |
| 2012-07-27 | 2012-07-31 | |||||
| CDM |
| 2012-10-02 | ||||||
| A2CD |
| 2012-12-05 | 2012-11-30 | |||||
| 2CD | 2013-02-28 | |||||||
713 kB
228 kBProject
IEC 62047-16 Ed. 1.0
Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films; wafer curvature and cantilever beam deflection methods
Remark:
Project plan - CDV: 2013-01, FDIS: 2014-01