International Standards and Conformity Assessment for all electrical, electronic and related technologies

SC 47F

Systèmes microélectromécaniques

 
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SC 47F Programme de Travail (5)

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IEC 62047-25 Ed. 1.0  

Dispositifs à semiconducteurs - Dispositifs microélectromécaniqueS - Partie 25: Technologie de fabrication de MEMS à base de silicium - Méthode de mesure de la résistance à la traction-compression et au cisaillement d'une micro zone de brasure
47F/219/CDV2013-03ADIS
  • ADIS
  • Approved for FDIS circulation

2015-11

DEC
  • DEC
  • Draft at Editing Check

2016-02

WG 1Z. Dacheng2016-07
IEC 62047-27 Ed. 1.0  

Dispositifs à semiconducteurs - Dispositifs microélectromécaniques - Partie 27: Essai de résistance du collage de structures collées par du verre fritté par des essais à microchevron
47F/230A/CDV2014-02CCDV
  • CCDV
  • Draft circulated as Committee Draft with Vote

2015-11

ADIS
  • ADIS
  • Approved for FDIS circulation

2016-05

WG 2L. Stühler2017-02
IEC 62047-28 Ed. 1.0  

Semiconductor devices - Micro-electromechanical devices - Part 28: Performance testing method of vibration-driven MEMS electret energy harvesting devices
47F/220/CD2014-08ACDV
  • ACDV
  • Draft approved for Committee Draft with Vote

2015-08

CCDV
  • CCDV
  • Draft circulated as Committee Draft with Vote

2015-11

WG 3Y. Suzuki2017-03
IEC 62047-29 Ed. 1.0  

Semiconductor devices - Micro-electromechanical devices - Part 29: Electromechanical relaxation test method for freestanding MEMS materials under room temperature
47F/224/NP2015-11ANW
  • ANW
  • Approved New Work

2015-11

1CD
  • 1CD
  • 1st Committee Draft

2016-01

WG 2J H Kim, H J Lee2019-03
IEC 62047-30 Ed. 1.0  

Semiconductor devices - Micro-electromechanical devices - Part 30: Measurement methods of electro-mechanical conversion characteristics of MEMS piezoelectric thin film and reporting schema
47F/225/NP2015-11ANW
  • ANW
  • Approved New Work

2015-11

1CD
  • 1CD
  • 1st Committee Draft

2015-12

WG 2I. Kanno2018-01